reactive magnetron sputtering造句
例句与造句
- photo-induced catalytic characteristics of tio2 thin films deposited by dc reactive magnetron sputtering
直流反应磁控溅射制备二氧化钛薄膜的光催化性研究 - ultrathin aluminum films were prepared by dc reactive magnetron sputtering . the target was made by 99.999 % pure aluminum
采用直流磁控溅射法溅射纯度为99.999%的铝靶制备了超薄铝膜。 - in the first part of the thesis tin film in different n2 partial pressure prepared by reactive magnetron sputtering is studied
本文首先研究了磁控溅射法在不同氮气分压下所制备的tin薄膜。 - the results indicate that it has an excellent surface . aln thin film was prepared from an aluminum target by dc and af reactive magnetron sputtering in nitrogen gas mixed with argon gas
氮化铝薄膜样品是利用高纯铝靶,在氮气加氩气气氛下用直流和射频反应磁控溅射法制备的。 - three kinds of different methods, namely anode oxidation, micro-arc oxidation and dc reactive magnetron sputtering, were employed to treat aluminum substrate which is used for power electronic devices in order to get an insulating surface by form a layer of aluminum nitride ( aln ) or aluminum oxide ( al2o3 ) film
本文分别采用阳极氧化法、微弧氧化法和磁控反应溅射沉积氮化铝薄膜的方法对功率电子器件用金属铝基板表面进行绝缘化处理。 - It's difficult to find reactive magnetron sputtering in a sentence. 用reactive magnetron sputtering造句挺难的
- firstly, the tio2 thin films are deposited by dc reactive magnetron sputtering apparatus, and characterlized by n & k analyzer1200, x-ray diffraction spectroscopy ( xrd ), scanning electronic microscopy ( sem ), alpha-step500 . and it was analyzed that the effect on performance and structure of films with the change of argon flow, total gas pressure, the substrate-to-target distance and temperature
第一、应用稳定的直流磁控溅射设备制备tio2减反射薄膜并通过n&kanalyzer1200薄膜光学分析仪、x射线衍射分析(xrd)、扫描电子显微镜(sem)、alpha-step500型台阶仪等仪器对薄膜进行表征,分析氧分压、总气压、工作温度、靶基距等制备工艺参数对薄膜性能结构的影响。 - because of it is not sensitive to hydrogen at normal temperature, so tungsten oxide with doped catalyst to improving its hydrogen response was adopted . the tungsten oxide films with pt and pdcl2 catalyst were prepared with sol-gel and dc reactive magnetron sputtering methods . simultaneously the optical property and surface structure of the catalyst films was studied
由于三氧化钨薄膜在常温下对氢气不敏感,本文采用掺杂改性来改善三氧化钨薄膜材料的氢敏性能,分别采用直流磁控溅射法和溶胶凝胶法制备了均匀的三氧化钨掺铂和掺钯薄膜材料,并对它的光学性质、表面形态、结构等进行了深入的研究。